Computational modeling of transport phenomena in chemical vapor deposition
Author:
Publisher
Springer Science and Business Media LLC
Subject
Fluid Flow and Transfer Processes,Condensed Matter Physics
Link
http://link.springer.com/content/pdf/10.1007/s00231-004-0571-z.pdf
Reference20 articles.
1. Vossen JL, Kern W (1991) Thin film processes II. Academic, Boston
2. Hitchman ML, Jensen KF (1993) Chemical vapor deposition?principles and applications. Academic, London
3. Jones AC, O?Brien P (1997) CVD of compound semiconductors. VCH, Weinheim
4. Klejin CR (2000) Computational modeling of transport phenomena and detailed chemistry in chemical vapor deposition?a benchmark solution. Thin Solid Films 365:294?306
5. Jensen KF, Einest EO, D, Fotiadis DI (1991) Flow phenomena in chemical vapor deposition of thin films. Annu Rev Fluid Mech 23:197?232
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Effect of Boundary Layers on Polycrystalline Silicon Chemical Vapor Deposition in a Trichlorosilane and Hydrogen System;Chinese Journal of Chemical Engineering;2011-02
2. Mixed convection flow investigation in a rectangular horizontal tube stenosis via liquid crystal thermography and planar PIV;Experimental Thermal and Fluid Science;2011-02
3. Heat transfer—A review of 2005 literature;International Journal of Heat and Mass Transfer;2010-10
4. Effect of embedding a porous medium on the deposition rate in a vertical rotating MOCVD reactor based on CFD modeling;International Communications in Heat and Mass Transfer;2009-08
5. Numerical investigations of geometric effects on flow and thermal fields in a horizontal CVD reactor;Journal of Crystal Growth;2008-06
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3