The Extended Range of Reaction-layer Fatigue Susceptibility of Polycrystalline Silicon Thin Films
Author:
Publisher
Springer Science and Business Media LLC
Subject
Mechanics of Materials,Modeling and Simulation,Computational Mechanics
Link
http://link.springer.com/content/pdf/10.1007/s10704-005-3469-y.pdf
Reference41 articles.
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3. Bagdahn J., Sharpe W.N.J. (2002). Eighth International Fatigue Congress, Fatigue 2002.
4. Fatigue of polycrystalline silicon under long-term cyclic loading
5. An electrochemical and ellipsometric study of oxide growth on silicon during anodic etching in fluoride solutions
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