Study of grown-in defects and effect of thermal annealing in Al0.3Ga0.7As and GaAs LPE layers

Author:

Li Sheng S.,Lin C. Y.,Bedair S. M.,Hutchby J. A.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference10 articles.

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2. S. M. Bedair, S. B. Phatak, and J. R. Hauser, IEEE Trans. on Elec. Devices.Ed-27, 822 (1980).

3. M. F. Lamorte and D. Abbot, Solid State Electron.26, 467 (1979).

4. S. S. Li, D. W. Schoenfeld, T. T. Chiu, C. Y. Lin, and S. M. Bedair,Proc. of the 11th Int. Conf. on Defects and Radiation Effects in Semiconductors, Inst. Phys. Conf. Ser. No. 59, 305 (1980).

5. S. S. Li ,Proc. of IEEE 15th Photovoltaic Specialists Conf., 1283 (1981).

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1. Behavior of types A and B hole traps in n-type GaAs during long-period operation;Solid-State Electronics;1992-09

2. Deep levels and DX centers in AlxGa1−xAs/GaAs. II. Field effect deep level transient spectroscopy study;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1992-01

3. Dopant‐dependent formation and annealing of the dominant native deep‐level defect in liquid‐phase epitaxial AlGaAs;Journal of Applied Physics;1989-05

4. Characterization and kinetics of AlxGa1−xAs by organometallic-CVD;Progress in Crystal Growth and Characterization;1986-01

5. gallium aluminum arsenide (Ga(1-x)Al(x)As), deep defects;Impurities and Defects in Group IV Elements, IV-IV and III-V Compounds. Part b: Group IV-IV and III-V Compounds.

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