Author:
Michael Nancy L.,Kim Choong-Un,Jiang Qing-Tang,Augur R. A.,Gillespie P.
Publisher
Springer Science and Business Media LLC
Subject
Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. N.E. Meier, T.N. Marieb, P.A. Flinn, R.J. Gleixner, and J.C. Bravman, Stress Induced Phenomena in Metallization: Fifth International Workshop, ed. O. Kraft, E. Artz, and C.A. Volkert (American Institute of Physics, 1999), p. 180.
2. L. Arnaud, R. Gonella, G. Tartavel, J. Torres, C. Gounelle, Y. Gobil, and Y. Morand, Micro. Reliab. 38, 1029 (1998).
3. J. Proost, T. Hirato, T. Furuhara, K. Maex, and J.-P. Celis, J. Appl. Phys. 87, 2792 (2000).
4. N.D. McCusker, H.S. Gamble, and B.M. Armstrong, Micro. Reliab. 40, 69 (2000).
5. C.-K. Hu, R. Rosenberg, and K.Y. Lee, Appl. Phys. Lett. 74, 2945 (1999).
Cited by
14 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献