Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets-Reference-Cited by-同舟云学术

Electron Cyclotron Resonance Used in Low-Pressure Microwave Plasma Reactors with Permanent Magnets

Published:2005-07 Issue:4 Volume:34 Page:210-216
ISSN:1063-7397
Container-title:Russian Microelectronics
language:en
Short-container-title:Russ Microelectron

Author:

Petrin A. B.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11180-005-0030-7.pdf

Reference16 articles.

1. Plasma Processing for VLSI, Einspruch, N.G. and Brown, D.M., Eds., VLSI Electronics: Microstructure Science, vol. 8, Orlando, Fla.: Academic, 1984.

2. Raizer, Yu.P., Fizika gazovogo razryada (Gas-Discharge Physics), Moscow: Nauka, 1987.

3. Chen, F.F., Introduction to Plasma Physics and Controlled Fusion, vol. 1: Plasma Physics, New York: Plenum, 1984.

4. Lieberman, M.A. and Lichtenberg, A.J., Principles of Plasma Discharges and Material Processing, New York: Wiley, 1994.

5. Gorbatkin, S.M., Berry, L.A., and Roberto, J.B., Behavior of Ar Plasmas Formed in a Mirror Field Electron Cyclotron Resonance Microwave Ion Source, J. Vac. Sci. Technol., A, 1990, vol. 8, no.3, p. 2893.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Utilization of ECR mechanism of electrons heating in multipolar magnetic systems of low-pressure plasma Reactors;IEEE Transactions on Plasma Science;2006-02

2. Sustaining Mechanisms of the ECR Heating of Electrons in Low-Pressure Microwave Plasmas under Magnetic Multipole Confinement;Russian Microelectronics;2005-09