ESR Studies of Ion Implanted Si-SiO2 Structure
Author:
Izumi T.,Matsumori T.
Reference13 articles.
1. T. Tokuyama, Proc. 5th Conf. of Solid State Devices, Tokyo 1973, p. 499.
2. N. J. Chou and B. L. Crowder, J. Appl. Phys. 41, 1731 (1970).
3. T. Tokuyama, et al, 3rd Intern. Conf. Ion Implantation in Semicond. and Other Materials, (1973), p. 159.
4. T. W. Sigmonand R. Swanson, Solid State Electro. 16, 1217 (1973).
5. B. L. Crowder, et al, Appl. Phys. Letters 16, 205 (1970).