Impurity Analysis on Si Wafer Using Monochro-Trex-Reference-Cited by-同舟云学术

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Impurity Analysis on Si Wafer Using Monochro-Trex

Published:1991 Issue: Volume: Page:81-89
ISSN:
Container-title:Advances in X-Ray Analysis
language:
Short-container-title:

Author:

Nishihagi Kazuo,Yamashita Noboru,Fujino Nobukatsu,Taniguchi Kazuo,Ikeda Shigero

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4615-3744-1_8

Reference9 articles.

1. K. Taniguchi, S. Sumita, A. Sasaki, K. Nishihagi and N. Fujino: Abst. 39th Annual Denver X-Ray Conf. (1990)

2. M. Shuster: Abst. 39th Annual Denver X-Ray Conf. (1990)

3. T. Tsuchiya and Y. Matsushita: Abst. 39th Annual Denver X-Ray Conf. (1990)

4. K. Nishihagi, N. Fujino, K. Taniguchi and S. Ikeda: Abst. 39th Annual Denver X-Ray Conf. (1990)

5. R. S. Hockett: SPIE Symposium on Microelectronic Integrated Processing (1989)

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. TXRF Semiconductor Applications;Advances in X-Ray Analysis;1994

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