Study of Growth Processes in Ferroelectric Films and Layered Heterostructures via in Situ, Real-Time Ion Beam Analysis

Author:

Auciello Orlando,Krauss Alan R.,Im Jaemo

Publisher

Springer US

Reference69 articles.

1. “Proceedings of the 3th, 4th and 5th International Symposium on Integrated Ferroelectrics (ISIF), C. A. Paz de Araujo et al. (Eds.) (University of Colorado Press, Colorado Springs, 1991, 1992 and 1993). Proc. 6th ISIF, R. Zuleeg (Ed.), Integrated Ferroelectrics vol. 6-8 (1995). Proc. 7th ISIF, A. I. Kingon (ed.), Integrated Ferroelectrics vol. 10-11 (1995).

2. “Ferroelectric Thin Films I,” MRS Symposia Proc. vol. 200, (MRS, Pittsburgh, 1990), E. R. Myers and A. I. Kingon (Eds.). “Ferroelectric Thin Films II,” MRS Symposia Proc. vol. 243, (MRS, Pittsburgh, 1991) A. I. Kingon, E. R. Myers and B. Tuttle (Eds.). “Ferroelectric Thin Films III,” MRS Symposia Proc. vol. (MRS, Pittsburgh, 1993). “Ferroelectric Thin Films IV,” MRS Symposia Proc. vol. 361 (MRS, Pittsburgh, 1995).

3. “Science and Technology of Electroceramic Thin Films,” NATO/ASI Book Series E 284, O. Auciello and R. Waser (Eds.) (Kluwer Academic Publishers, The Netherlands, 1995).

4. “Pulsed Laser Ablation Deposition,” MRS Bulletin vol. 17, G. K. Hubler (Ed.) (1992).

5. O. Auciello, A. R. Krauss and K. D. Gifford, Ch. 10 in “Ferroelectric Thin Films: Synthesis and Basic Properties,” C. A. Paz de Araujo, J. F. Scott and G. W. Taylor (Eds.), Gordon and Breach (1996) p. 393.

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