1. T.O. Sedgwick, Proc.Symp. “Reduced Temperature Processing for VLSI”, Eds.G.R. Strinivasan and R. Reif 86–5, Electrochem.Soc., Princeton, NJ 1086, p.49.
2. H.C. de Graaf and J.G. de Groot, IEEE Trans. Electron Dev. ED-26, 1771 (1979)
3. C.Y. Wong, A.E. Michel, R.D. Isaac, R.H. Kastl and S.R. Mader, J.Appl.Phys. 55, 1131 (1984).
4. T. Hara, H. Suzuki and M. Furukawa, Jap. J.Appl.Phys. 23, L452 (1984).
5. N.S. Alvi and D.L. Kwong, J.Electrochem.Soc. 133, 2626 (1986)