Application of the Boltzmann Transport Equation to the Calculation of Range Profiles and Recoil Implantation in Multilayered Media-Reference-Cited by-同舟云学术

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Application of the Boltzmann Transport Equation to the Calculation of Range Profiles and Recoil Implantation in Multilayered Media

Published:1977 Issue: Volume: Page:333-345
ISSN:
Container-title:Ion Implantation in Semiconductors 1976
language:
Short-container-title:

Author:

Smith D. H.,Gibbons J. F.

Publisher

Springer US

Link

http://link.springer.com/content/pdf/10.1007/978-1-4613-4196-3_36.pdf

Reference11 articles.

1. T.R. Cass and V.G.K. Reddi, Appl. Phys. Lett. 23, 268 (1973).

2. E.H. Bogardus and M.R. Poponiak, Appl. Phys. Lett. 23, 553 (1973).

3. W.K. Chu, H. Muller, and J.W. Mayer, Appl. Phys. Lett. 25, 297 (1974).

4. R.A. Moline, G.W. Reutlinger, and J.C. North, Proc. of the Fifth International Conf. on Atomic Collisions in Solids, Gatlinburg, Tenn., Plenum Press, New York (to be published).

5. K.B. Winterbon, P. Sigmund and J.B. Sanders, Mat. Fys. Medd. Dan. Vid. Selsk. 37, No. 14 (1970).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Process Simulation;Microelectronic Materials and Processes;1989

2. Special Processes Developed for Microcircuit Technology;The Physics of Microfabrication;1982

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