1. D. L. Flamm and G. H. Herb, ?Plasma etching technology?An overview,? inPlasma Etching?An Introduction, D. M. Manos and D. L. Flamm, eds., Academic Press, San Diego (1989).
2. D. C. Gray, I. Tepermeister, and H. H. Sawin,J. Vac. Sci. Technol. B 11, 1243 (1993);
3. N. B. Chakrabarti and S. K. Ray, Proc. 1st National Symp. on Microlithography, Pilani, 267, March 11?12, 1986.
4. H. Kaufmann,J. Vac. Sci. Technol. A 4, 764 (1986).
5. J. Asmussen, ?Electron cyclotron resonance microwave discharges for etching and thin film deposition,? inHandbook of Plasma Processing Technology, Noyes Publications, New Jersey (1990), p. 285.