The influence of a HF and an annealing treatment on the barrier height of p- and n-type Si MIS structures-Reference-Cited by-同舟云学术

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The influence of a HF and an annealing treatment on the barrier height of p- and n-type Si MIS structures

Published:1986-02 Issue:2 Volume:39 Page:129-133
ISSN:0721-7250
Container-title:Applied Physics A Solids and Surfaces
language:en
Short-container-title:Appl. Phys. A

Author:

Hanselaer P. L.,Lafl�re W. H.,Meirhaeghe R. L.,Cardon F.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00616830.pdf

Reference27 articles.

1. J.P. Ponpon, R. Stuck, P. Siffert: Proc. 12th IEEE Photo. Spec. Conf. (1976) p. 900

2. O.L. Krivanek, J.H. Mazur: Appl. Phys. Lett.37, 392 (1980)

3. E.H. Nicollian: J. Vac. Sci. Technol.14, 1112 (1977)

4. H.C. Card: Solid-State Electron.22, 809 (1979)

5. M.A. Taubenblatt, D. Thomson, C.R. Helms: Appl. Phys. Lett.44, 895 (1984)

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