Development of a Vaporizer for Gradual Vaporization Control of Precursor Materials in the CVD Process
Author:
Funder
Samsung Electronics
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s13391-021-00280-1.pdf
Reference13 articles.
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2. Mu, X., Liu, X., Zhang, K., et al.: Molybdenum dioxide-anchored graphene foam as a negative electrode material for supercapacitors. Electron. Mater. Lett. 12, 296–300 (2016). https://doi.org/10.1007/s13391-015-5382-5
3. Deal, B.E., Grove, A.S.: General relationship for the thermal oxidation of silicon. J. Appl. Phys. 36(12), 3770–3778 (1965)
4. Chee, S.S., Kim, H., Son, M., et al.: Aspect ratio control of copper nanowire via solution process and its flexible transparent conductive electrode applications. Electron. Mater. Lett. 16, 404–410 (2020). https://doi.org/10.1007/s13391-020-00223-2
5. Tsai, Y.H., Hsu, S.L., Tseng, F.C., Yoo, C.S.: Investigation on the flow properties of BPSG films. In: International Symposium on VLSI Technology, Systems and Applications, Taipei, Taiwan, pp. 83–88, (1989). https://doi.org/10.1109/VTSA.1989.68588
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3. Correction to: Development of a Vaporizer for Gradual Vaporization Control of Precursor Materials in the CVD Process;Electronic Materials Letters;2021-08-26
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