Structural, Electrical and Optical Characterization of Sputtered ZnOx Thin Film-Reference-Cited by-同舟云学术

Structural, Electrical and Optical Characterization of Sputtered ZnOx Thin Film

Published:1990 Issue: Volume: Page:200-204
ISSN:
Container-title:Transactions of the Materials Research Society of Japan
language:
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Author:

Nishihara T.,Fujimura N.,Ito T.

Publisher

Springer Netherlands

Link

http://link.springer.com/content/pdf/10.1007/978-94-009-0789-8_17.pdf

Reference6 articles.

1. Characterization of ZnO piezoelectric films prepared by rf planar-magnetron sputtering T. Yamamoto, T. Siosaki and A. Kawabata: J.Appl.Phys. 51 (1980) P 3113–3120.

2. Reactive synthesis of well-oriented zinc-oxide films by means of the facing targets sputtering method M. Matsuoka, Y. Hoshi and M. Naoe: J.Appl.Phys. 63 (1988) P 2098–2103

3. The effect of 0 on reactively sputtered zinc oxide C.R. Aita, A.J. Purdes, R.J. Lad and P.D. Funkenbusch: J.Appl.Phys. 51 (1980) P 5533–5536.

4. Effects of oxygen partial pressure on the structure of ZnO thin films prepared by reactive RF sputtering H. Kobayashi, Y. Igasaki and G. Shimaoka: Bull.Res.Inst.Electron. Shizuoka Univ. 19 (1984) P 47–53.

5. Photochromism and anomalous crystallite orientation of ZnO films prepared by a sputtering-type electron resonance microwave plasma M. Matsuoka and K. Ono: Appl.Phys.Lett. 53 (1988) P 1393–1395.

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1. Formation of (1120) ZnO Films by Controlling the Selftexture and the Relaxation of Film Stress;MRS Proceedings;1992

2. Relationship between Self-Texture and Interfacial Restriction on the Epitaxy of (Ca,Sr)CuO2 Thin Films;MRS Proceedings;1992

3. Heteroepitaxy of LiNbO3 and LiNb3O8 thin films on C-cut sapphire;Journal of Crystal Growth;1991-12

4. Heteroepitaxy of zinc oxide thin films, considering non-epitaxial preferential orientation;Journal of Crystal Growth;1991-12