Author:
Habraken F. H. P. M.,Ullersma E. H. C.,Arnoldbik W. M.,Kuiper A. E. T.
Reference28 articles.
1. Habraken, F.H.P.M. and Kuiper, A.E.T. (1994) Silicon nitride and oxynitride films, Materials Science and Engineering
R12, 123–175.
2. Feldman, L.C. and Mayer, J.W. (1986) Fundamentals of surface and thin film analysis, Elsevier Science Publishers, Amsterdam
3. Arnold Bik, W.M. and Habraken, F.H.P.M. (1993) Elastic recoil detection, Rep. Prog. in Phys.
56, 859–902.
4. Lanford, W.A., Trautvetter, H.P., Ziegler, J.F., and Keller, J., (1976) New precision technique for measuring the concentration versus depth of hydrogen in solids, Applied Phys. Lett.
28, 566–568.
5. Chow, R., Lanford, W.A., Ke-Ming, W. and Rosier, R.S. (1982) Hydrogen content of a variety of plasma-deposited silicon nitrides, J. Appl. Phys.
53, 5630–5633.
Cited by
1 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献