Chemical Vapor Deposition (CVD)
Author:
Publisher
Springer Netherlands
Link
http://link.springer.com/content/pdf/10.1007/978-94-017-9780-1_345
Reference25 articles.
1. Tsu, D.V., Lucovsky, G., Dvidson, B.N.: Effects of the nearest neighbors and the alloy matrix on SiH stretching vibrations in the amorphous SiOr:H (0
2. Menda, J., et al.: A Dual-RF-Plasma Approach for Controlling the Graphitic Order and Diameters of Vertically-Aligned Multiwall Carbon Nanotubes. Appl. Phys. Lett. 87, 173106 (2005) (3 pp)
3. Hirao, T., et al.: Formation of vertically aligned carbon nanotubes by dual-RF-plasma chemical vapor deposition. Jpn. J. Appl. Phys. 40, L631–L634 (2001)
4. van Laake, L., Hart, A.J., Slocum, A.H.: Suspended heated silicon platform for rapid thermal control of surface reactions with application to carbon nanotube synthesis. Rev. Sci. Instrum. 78, 083901 (2007) (9 pp)
5. Leskelä, M., Ritala, M.: Atomic layer deposition chemistry: Recent developments and future challenges. Angew. Chem. Int. Ed. 42, 5548–5554 (2003)
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