Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition-Reference-Cited by-同舟云学术

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Formation of Vertically Aligned Carbon Nanotubes by Dual-RF-Plasma Chemical Vapor Deposition

Published:2001-06-15 Issue:Part 2, No. 6B Volume:40 Page:L631-L634
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Hirao Takashi,Ito Korekiyo,Furuta Hiroshi,Yap Yoke Khin,Ikuno Takashi,Honda Shin-ichi,Mori Yusuke,Sasaki Takatomo,Oura Kenjiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 32 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Conventional techniques for nanomaterials preparation;Sustainable Nanotechnology for Environmental Remediation;2022

2. Microwave-Assisted Synthesis for Carbon Nanomaterials;Nanomaterials Synthesis;2019

3. Elaboration of carbon nanowalls using radio frequency plasma enhanced chemical vapor deposition;Materials Today: Proceedings;2018

4. Carbon Nanotube (CNT);Carbon;2017-10-27

5. Optical properties of vertically aligned graphene sheets;MRS Advances;2017-01

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