Author:
Diawara Y.,Currie J. F.,Yelon A.
Reference9 articles.
1. A. Uhlir., Bell System Tech. J. 35, 333(1956).
2. K.Imal and H. Unno.(1984), “ FIPOS (Full Isolation by Porous Oxidized Silicon) technology and it‘s application to LSI’s”, IEEE Trans. Electron Dev. ED-31 , 297–302.
3. V. Lehman and U. Gösele.(1991) , “ Porous silicon formation: aquantum wire effect”, Appl. Phys. Lett. 58, 856–858.
4. L.T. Canham, (1990), “ Silicon quantum wire array fabrication by electrochemical and chemical dissolution of waters.”, Appl. Phys. Lett., 57, 1046–1048
5. S.Poulin, Y.Diawara,J.F.Currie, A.Yelon, S.C.Gujrathi and V.Petrova-Koch, “Preparation and chemical investigation of porous silicon”, To be published in Mater. Res. Soc. Proc. Boston, 1992.
Cited by
2 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献