1. W. Kern and V. S. Ban, Thin Film Processes, J. L. Vossen and W. Kern, Eds.,Academic Press, New York (1978), p. 257.
2. S. M. Ojha, Physics of Thin Films, Vol. 12, G. Hass, M. H. Francome, and J. L. Vossen, Eds., Academic Press, New York (1982), p. 237.
3. W. Kern, Semicond. Int., 3 (3) 89 (1982).
4. T. D. Bonifield, Deposition Technologies for Films and Coatings: Development and Applications, Noyes, Park Ridge, New Jersey (1982), p. 365.
5. J. Y. Chen, R. C. Henderson, J. T. Hall, and J. W. Peters, J. Electrochem. Soc, 131, 2146 (1984).