Material Engineering for PCM Device Optimization

Author:

Sousa Véronique,Navarro Gabriele

Publisher

Springer International Publishing

Reference64 articles.

1. G. Servalli, A 45nm generation phase change memory technology. IEEE International Electron Devices Meeting (IEDM) Location: Baltimore, MD Date: DEC 7–9, 2009; Published: 2010

2. S.H. Lee, et al., Highly productive PCRAM technology platform: Based on 4F2 (84nm pitch) cell scheme for 1 Gb and beyond. IEEE International Electron Devices Meeting (IEDM) Location: Washington, DC Date: DEC 5–7, 2011; Published: 2012

3. Y. Choi, et al., A 20nm 1.8V 8Gb PRAM with 40MB/s Program Bandwidth. IEEE International Solid-State Circuits Conference (ISSCC) Location: San Francisco, CA Date: FEB 19–23, 2012; Published: 2012

4. M.J. Kang, et al., PRAM cell technology and characterization in 20nm node size. IEEE International Electron Devices Meeting (IEDM) Location: Washington, DC Date: DEC 5–7, 2011; Published: 2012

5. R. Krishnamurthy, Inside the Samsung 512 Mb Phase Change Memory at http://ww3.chipworks.com/ko/technical-competitive-analysis/resources/blog/a-peek-inside-the-samsung-512-mb-4f2-cross-point-phase-change-memory/ (2011)

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