Chemical vapour deposition of Si3N4 from a gas mixture of Si2Cl6, NH3 and H2-Reference-Cited by-同舟云学术

Chemical vapour deposition of Si3N4 from a gas mixture of Si2Cl6, NH3 and H2

Published:1986-11 Issue:11 Volume:21 Page:3836-3842
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Motojima Seiji,Iwamori Noriyuki,Hattori Tatsuhiko

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF02431619.pdf

Reference31 articles.

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3. M. Maeda andY. Arita,J. Appl. Phys. 53 (1982) 6852.

4. K. Katoh, M. Yasui andH. Watanabe,Jpn J. Appl. Phys. 22 (1983) L321.

5. C. Blaauw,J. Electrochem. Soc. 131 (1984) 1114.

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