Diagnosis Model of Radio Frequency Impedance Matching in Plasma Equipment by Using Neural Network and Wavelets
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-540-36668-3_121.pdf
Reference14 articles.
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2. Hong, S.J., May, G.S.: Neural Network-Based Real-Time Malfunction Diagnosis of Reactive Ion Etching Using In Situ Metrology Data. IEEE Trans. Semicond. Manufact. 17(3), 408–421 (2004)
3. Kim, B., Bae, J., Hong, W.S.: Plasma Control Using Neural Network and Optical Emission Spectroscopy. J. Vac. Sci. Technol. A 23(2), 355–358 (2005)
4. Kim, B., Kim, S.: Plasma Diagnosis by Recognizing In-Situ Data Using a Modular Backpropagation Network. Chemometr. Intell. Lab. Syst. 65(2), 231–240 (2003)
5. Kim, B., Kim, S.: Partial Diagnostic Data to Plasma Etch Modeling Using Neural Network. Microelectron. Eng. 75(4) (2004)
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