Neural Network Recognition of Scanning Electron Microscope Image for Plasma Diagnosis
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Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-540-36668-3_38.pdf
Reference11 articles.
1. Stevenson, J.O., Ward, P.P., Smith, M.L., Markle, R.J.: A Plasma Process Monitor/Control System. Surf. Interf. Anal. 26, 124–133 (1998)
2. Bose, F., Patrick, R., Baltes, H.: Measurement of Discharge Impedance for Dry Etch Process Control. SPIE 2336, 101–110 (1994)
3. Kim, B., Lee, C.: Monitoring Plasma Impedance Match Characteristics in a Multipole Inductively Coupled Plasma for Process Control. J. Vac. Sci. Technol. A 18(1), 58–62 (2000)
4. Kim, B., May, G.S.: Real-Time Diagnosis of Semiconductor Manufacturing Equipment Using a Hybrid Neural Network Expert System. IEEE Trans. Comp. Packag Manufact. Technol. 20(1), 39–47 (1997)
5. Kim, B., Choi, W., Lim, M.T.: Wavelet Monitoring of Plasma Etching. J. Vac. Sci. Technol. B 21(6), 2329–2333 (2003)
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