Attachment and ionization in a self-consistent treatment of the electron kinetics of a collision-dominated rf plasma-Reference-Cited by-同舟云学术

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Attachment and ionization in a self-consistent treatment of the electron kinetics of a collision-dominated rf plasma

Published:1987-09 Issue:3 Volume:7 Page:245-265
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Winkler R.,Dilonardo M.,Capitelli M.,Wilhelm J.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01016516.pdf

Reference10 articles.

1. S. C. Brown,Encyclopedia of Physics, Vol. 21, Springer, Berlin (1956), p. 531.

2. D. J. Rose and S. C. Brown,Phys. Rev.,98, 310 (1985).

3. R. Winkler, M. Dilonardo, M. Capitelli, and J. Wilhelm, Plasma Chem. Plasma Process., in press.

4. C. M. Ferreira and J. Loureira,J. Phys. D; Appl. Phys. 17, 84 (1975).

5. P. M. Vallinga, T. Bisschops, and H. T. C. Stoof, ISPC-7, Eindhoven, 1985, Symposium Proceedings Vol. 4, p. 1399.

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