Author:
Hu Steve,Cho Jeong-Hyun,Gracias David H.
Reference124 articles.
1. R. Chau, J. Kavalieros, B. Roberds, R. Schenker, D. Lionberger, D. Barlage, B. Doyle, R. Arghavani, A. Murthy, G. Dewey, 30 nm physical gate length CMOS transistors with 1.0 ps n-MOS and 1.7 ps p-MOS gate delays. International Electron Devices Meeting Technical Digest 2000, IEEE, San Francisco, CA, pp. 45–48, 2000
2. S.Y. Chou, P.R. Krauss, P.J. Renstrom, Imprint lithography with 25-nanometer resolution. Science 272, 85 (1996)
3. R.M. Langford, P.M. Nellen, J. Gierak, Y. Fu, Focused ion beam micro- and nanoengineering. MRS Bull. 32, 417 (2007)
4. S. Roy, Fabrication of micro- and nano-structured materials using mask-less processes. J. Phys. D: Appl. Phys. 40, R413 (2007)
5. J.P. Rolland, B.W. Maynor, L.E. Euliss, A.E. Exner, G.M. Denison, J.M. DeSimone, Direct fabrication and harvesting of monodisperse, shape-specific nanobiomaterials. J. Am. Chem. Soc. 127, 10096 (2005)
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