Memristive/CMOS Devices for Neuromorphic Applications
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Publisher
Springer International Publishing
Link
https://link.springer.com/content/pdf/10.1007/978-3-030-79827-7_32
Reference200 articles.
1. Moore, G.E.: Cramming more components onto integrated circuits. Electronics. 38(8), 114–117 (1965)
2. Wu, S.-Y., et al.: A 7 nm CMOS platform technology featuring 4th generation FinFET transistors with a 0.027μm2 high density 6-T SRAM cell for mobile SoC applications. In: IEEE IEDM Tech. Dig. pp. 43–46 (2016). https://doi.org/10.1109/iedm.2016.7838333
3. Xie, R., et al.: A 7nm FinFET technology featuring EUV patterning and dual strained high mobility channels. In: IEEE IEDM Tech. Dig. pp. 47–50 (2016). https://doi.org/10.1109/IEDM.2016.7838334
4. Kuhn, K.J.: Considerations for ultimate CMOS scaling. IEEE Trans. Electron Devices. 59(7), 1813–1828 (2012). https://doi.org/10.1109/TED.2012.2193129
5. Vinet, M., et al.: Monolithic 3D integration: A powerful alternative to classical 2D scaling. In: 2014 SOI-3D-Subthreshold Microelectronics Technology Unified Conference (S3S), pp. 1–3 (2014). https://doi.org/10.1109/S3S.2014.7028194
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