Influence of oxygen partial pressure on the structural, optical and electrical properties of magnetron sputtered Zr0.7Nb0.3O2 films
Author:
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
https://link.springer.com/content/pdf/10.1007/s00339-021-05136-x.pdf
Reference34 articles.
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2. R. H. Piva, D. H. Piva, M. R. Morelli, Synthesis by coprecipitation of indium oxide stabilized zirconium oxide and co-doping with MoO3, WO3, TaO2.5 or NbO2.5 for application as thermal barrier coatings. Mater Res 19, 1 (2016)
3. S.W. Park, H.B. Im, Effect of oxygen conditions on the properties of tantalum oxide films on silicon substrates. Thin Solid Films 207, 258–264 (1992)
4. B. Orel, M. Macek, J. Grasadolnik, A. Meden, In-situ UV-Vis and ex-situ IR spectro-electrochemical investigations of amorphous and crystalline electrochromic Nb2O5 films in charged/discharged states. J Solid State Electrochem 2, 221–236 (1998)
5. L. Bocher, M.H. Aguirre, R. Robert, D. Logvinovich, S. Bakardjieva, J. Hejtmanek, A. Weidenkaff, High temperature stability, structure and thermoelectric properties of CaMn1-xNbxO3 phases. Acta Mater. 57, 5667–5680 (2009)
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