Nanoscale electronic inhomogeneity in ZrNx thin films growth by reactive sputtering at room temperature
Author:
Funder
ANPCYT
ANPCYP
Publisher
Springer Science and Business Media LLC
Subject
General Materials Science,General Chemistry
Link
https://link.springer.com/content/pdf/10.1007/s00339-022-05893-3.pdf
Reference38 articles.
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2. C.M. Zgrabik, LHu. Evelyn, Optimization of sputtered titanium nitride as a tunable metal for plasmonic applications. Opt. Mater. Exp. 5, 2786–2797 (2015). https://doi.org/10.1364/OME.5.002786
3. J.-S. Lee, J. Cho, C.-Y. You, Growth and characterization of α and β-phase tungsten films on various substrates. J. Vac. Sci. Technol. 34, 021502 (2016). https://doi.org/10.1116/1.4936261
4. M.J. Twu, A.H. Chiou, C.C. Hu, C.Y. Hsu, C.G. Kuo, Properties of TiO2 films deposited on flexible substrates using direct current magnetron sputtering and using high power impulse magnetron sputtering. Polym. Degrad. Stab. 117, 1–7 (2015). https://doi.org/10.1016/j.polymdegradstab.2015.03.010
5. Z. Rui, H. Zhenxuan, J. Xiangquan, Du. Jie Yang, Z.H. Bo, Yu. Shi, Deposition of molybdenum thin films on flexible polymer substrates by radio frequency magnetron sputtering. J. Nanosci. Nanotechnol. 16, 8154–8159 (2016). https://doi.org/10.1166/jnn.2016.12782
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