Modeling nanoparticle synthesis process using ferrocene/Ar/H2 low pressure RF plasma
Author:
Publisher
Springer Science and Business Media LLC
Subject
Industrial and Manufacturing Engineering,Modeling and Simulation
Link
https://link.springer.com/content/pdf/10.1007/s12008-023-01387-5.pdf
Reference52 articles.
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2. Cavallotti, C., Stanislao, M., Carrà, S.: Interplay of physical and chemical aspects in the PECVD and etching of thin solid films. Prog. Cryst. Growth Charact. Mater. 48(49), 123–165 (2004). https://doi.org/10.1016/j.pcrysgrow.2005.05.003
3. Meyyappan, M.: Plasma nanotechnology: past, present and future. J. Phys. D Appl. Phys. 44, 174002 (2011). https://doi.org/10.1088/0022-3727/44/17/174002
4. Kortshagen, U.: Nonthermal plasma synthesis of semiconductor nanocrystal. J. Phys. D Appl. Phys. 42, 113001 (2009). https://doi.org/10.1088/0022-3727/42/11/113001
5. Boufendi, L., Bouchoule, A.: Particle nucleation and growth in a low-pressure argon-silane discharge. Plasma Sources Sci. Technol. 3, 262–267 (1994). https://doi.org/10.1088/0963-0252/3/3/004
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