AlN epilayers and nanostructures growth in a homebuilt alumina hot-wall high temperature chemical vapor deposition system-Reference-Cited by-同舟云学术

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AlN epilayers and nanostructures growth in a homebuilt alumina hot-wall high temperature chemical vapor deposition system

Published:2014-03-12 Issue:5 Volume:25 Page:2210-2219
ISSN:0957-4522
Container-title:Journal of Materials Science: Materials in Electronics
language:en
Short-container-title:J Mater Sci: Mater Electron

Author:

Zhang Dian,Liu Fa-Min,Yao Yuan,Yang Xin-An

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s10854-014-1861-y.pdf

Reference47 articles.

1. H. Morkoc, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov, M. Burns, J Appl Phys 76, 1363 (1994)

2. O. Ambacher, J Phys D Appl Phys 31, 2653 (1998)

3. S. Pietranico, S. Pommier, S. Lefebvre, Z. Khatir, S. Bontemps, Microelectron Reliab 49, 1260 (2009)

4. R.T. Bondokov, S.G. Mueller, K.E. Morgan, G.A. Slack, S. Schujman, M.C. Wood, J.A. Smart, L.J. Schowalter, J Cryst Growth 310, 4020 (2008)

5. M.A. Moreira, I. Doi, J.F. Souza, J.A. Diniz, Microelectron Eng 82, 802 (2011)

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3. Preparation of ScAlN films as a function of power density on Si and flexible substrate by dc reactive magnetron sputtering;Journal of Materials Science: Materials in Electronics;2015-09-10

4. Investigation, characterization and effect of substrate position on thick AlN layers grown by high temperature chemical vapor deposition;Journal of Materials Science: Materials in Electronics;2014-11-26

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