Charge trapping characteristics of sputter-AlOx/ALD Al2O3/Epitaxial-GaAs-based non-volatile memory
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Published:2021-01-11
Issue:4
Volume:32
Page:4157-4165
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ISSN:0957-4522
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Container-title:Journal of Materials Science: Materials in Electronics
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language:en
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Short-container-title:J Mater Sci: Mater Electron
Author:
Mahata ChandreswarORCID, Ghosh Siddhartha, Chakraborty Sandipan, Patro Laxmi Narayana, Tripathi Anjana, Thapa Ranjit, Ramakrishna Seeram, Kim Sungjun, Dalapati Goutam Kumar
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
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