Investigation of concurrent flow of nitrogen and oxygen for the oxidation of cerium to cerium oxide films
Author:
Funder
Ministry of Higher Education Malaysia for Fundamental Research Grant Scheme
Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s10854-024-12105-6.pdf
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4. C.-H. Chen, Y.-K. Fang, S.-F. Ting, W.-T. Hsieh, C.-W. Yang, T.-H. Hsu, M.-C. Yu, T.-L. Lee, S.-C. Chen, C.-H. Yu, M.-S. Liang, Downscaling limit of equivalent oxide thickness in formation of ultrathin gate dielectric by thermal-enhanced remote plasma nitridation. IEEE Trans. Electron. Devices. 49, 840–846 (2002)
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