Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped-Reference-Cited by-同舟云学术

Removal of SU8 fine patterns with N-Methyl-2-Pyrrolidone doped

Published:2018 Issue:862 Volume:84 Page:18-00091-18-00091
ISSN:2187-9761
Container-title:Transactions of the JSME (in Japanese)
language:en
Short-container-title:

Author:

YASUI Manabu¹,NAKANO Hitoshi²,KUROUCHI Masahito¹,KAWANO Shin-ichi²,KANEKO Satoru¹

Affiliation:

1. Kanagawa Institute of Industrial Science and Technology

2. Nomura Micro Science Co., Ltd.

Publisher

Japan Society of Mechanical Engineers

Link

https://www.jstage.jst.go.jp/article/transjsme/84/862/84_18-00091/_pdf

Reference23 articles.

1. Abgrall, P., Lattes, C., Conédéra, V., Dollat, X., Colin, S. and Gué, A. M., A novel fabrication method of flexible and monolithic 3D microfluidic structures using lamination of SU-8 films, Journal of Micromechanics and Microengineering, Vol. 16 (2006), pp. 113-121.

2. Chang, T.-F. M., Ishiyama, C., Sato, T. and Sone, M., Quantitative study on removal of SU-8 photoresist patterns by supercritical CO₂ emulsion, Microelectronic Engineering, Vol. 110 (2013), pp.204-206.

3. Cui, F., Chen, W.-Y., Zhao, X.-L., Jing, X.-M. and Wu, X.-S., Metal foundation construction to consolidate electroplated structures for successful removal of SU-8 mould, Electronics Letters, Vol. 42 (2006), pp. 690 - 691.

4. Futai, N., Takano, A., Miyashita, M. and Tanaka, M., On-chip CO₂ incubation of microfluidic cell culture devices by humidity/gas exchange through poly(dimethylsiloxane) membrane, Seitaiikougaku, Vol. 47 No. 6 (2009), pp. 529-534 (in Japanese).

5. Gojo, R., Morimoto, Y. and Takeuchi, S., Quick and easy microchip fabrication, Seibutsu Butsuri, Vol. 50 No. 1 (2010), pp. 038-041 (in Japanese).