MD Simulation of Hardness Property of Al Thin Film Sputtered on Si Substrate and Its Related to Porosity.
Author:
Affiliation:
1. Graduate Student, Graduate School of Energy Science, Kyoto University
2. Department of Energy Conversion Science, Kyoto University
Publisher
Japan Society of Mechanical Engineers
Subject
Mechanical Engineering,General Materials Science
Link
http://www.jstage.jst.go.jp/article/jsmea/44/3/44_3_346/_pdf
Reference10 articles.
1. Internal stresses in metallic films deposited by cylindrical magnetron sputtering
2. Orientation of aluminum nuclei on Si(100) and Si(111)
3. Modified embedded-atom potentials for cubic materials and impurities
4. Atomistic calculations of composite interfaces
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