Ab Initio Analysis of Point Defects in Plane-Stressed Si Single Crystal

Author:

SUEOKA Koji1,WANG Yanbo1,SHIBA Seiji1,FUKUTANI Seishiro1

Affiliation:

1. Department of System Engineering, Okayama Prefectural University

Publisher

Japan Society of Mechanical Engineers

Subject

General Medicine

Reference23 articles.

1. Electron mobility enhancement in strained-Si n-type metal-oxide-semiconductor field-effect transistors

2. (2) Miura, H., Saishin Silicon Device to Kessyou Gijyutsu (in Japanese), (2005), pp. 50-71, Realize AT.

3. A model for oxygen precipitation in Czochralski silicon during crystal growth

4. (4) Shimura, F., Handoutai Silicon Kessyou Kougaku (in Japanese), (1993), p. 286, Maruzen.

5. (5) Sueoka, K., Shiba, S., and Fukutani, S., Transactions of the Japan Society of Mechanical Engineering, Series A, 72 (2006), pp. 801-808.

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