Ferroelectric Devices for Intelligent Computing

Author:

Han Genquan12,Peng Yue1,Liu Huan3,Zhou Jiuren12,Luo Zhengdong12,Chen Bing34,Cheng Ran4,Jin Chengji3,Xiao Wenwu5,Liu Fenning1,Zhao Jiayi34,Wang Shulong1,Yu Xiao3,Liu Yan12,Hao Yue1

Affiliation:

1. School of Microelectronics, Xidian University, Xi’an 710071, China

2. Hangzhou Institute of Technology, Xidian University, Hangzhou 311231, China

3. Research Center for Intelligent Chips, Zhejiang Laboratory, Hangzhou 311121China

4. School of Micro-Nano Electronics, Zhejiang University, Hangzhou 310027, China

5. Xi’an UniIC Semiconductors Company Ltd., Xi’an 710075China

Abstract

Recently, transistor scaling is approaching its physical limit, hindering the further development of the computing capability. In the post-Moore era, emerging logic and storage devices have been the fundamental hardware for expanding the capability of intelligent computing. In this article, the recent progress of ferroelectric devices for intelligent computing is reviewed. The material properties and electrical characteristics of ferroelectric devices are elucidated, followed by a discussion of novel ferroelectric materials and devices that can be used for intelligent computing. Ferroelectric capacitors, transistors, and tunneling junction devices used for low-power logic, high-performance memory, and neuromorphic applications are comprehensively reviewed and compared. In addition, to provide useful guidance for developing high-performance ferroelectric-based intelligent computing systems, the key challenges for realizing ultrascaled ferroelectric devices for high-efficiency computing are discussed.

Funder

National Natural Science Foundation of China

Zhejiang Province Key R&D Programs

Natural Science Foundation of Zhejiang Province

Major Scientific Research Project of Zhejiang Lab

Publisher

American Association for the Advancement of Science (AAAS)

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