Black-Arsenic-Based Visible–Near-Infrared Photodetector

Author:

Lv Xuyang12,Zhang Libo23,Jiang Mengjie12,Zhang Shi3,Han Li23,Zhang Kaixuan12,Liu Changlong3,Xing Huaizhong1,Chen Xiaoshuang23,Wang Lin2

Affiliation:

1. College of Science, State Key Laboratory for Modification of Chemical Fibers and Polymer Materials, DongHua University, Shanghai 201620, China.

2. State Key Laboratory for Infrared Physics, Shanghai Institute of Technical Physics, Chinese Academy of Sciences, Shanghai 200083, China.

3. College of Physics and Optoelectronic Engineering, Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, No. 1, Sub-Lane Xiangshan, Xihu District, Hangzhou 310024, China.

Abstract

Recently, black arsenic has joined the novel 2-dimensional van der Waals layered material family as a promising candidate for electronic and photonic applications owing to the tunable bandgap with layers, high carrier mobility, and anisotropic transport feature. To date, the extraordinary technological potential of black arsenic engineering nanophotoelectronic devices in the range from visible to near-infrared wavelength has not been reported. Here, we succeed in devising black arsenic visible–infrared detectors at the range from 520 to 1,550 nm, exhibiting a photoresponsivity of 0.4 A·W −1 and a detective of 1.37 × 10 8 Jones. Our studies underscore black arsenic as an emerging 2-dimensional van der Waals layered material for optoelectronic applications such as near-infrared sensing and imaging.

Publisher

American Association for the Advancement of Science (AAAS)

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