Affiliation:
1. Ciril-Ganil, 14040 Caen, France
2. CRN Laboratoire PHASE, 67037 Strasbourg, France
Abstract
A new method is proposed for preparing silicon P-N junctions. The first consists in fixing a transparent plastic film coated with a thin layer of a conventional dopant on the surface of the wafer, then illuminating this sandwich with a higher power Q switched laser. Two successive pulses are used, the first being able to transfer the dopant from the film to the silicon surface, the second to induce a liquid phase diffusion incorporating the dopant into the silicon lattice. Solar cells have been prepared by using this process, implying several attractive features.
Subject
Energy Engineering and Power Technology,Renewable Energy, Sustainability and the Environment
Cited by
6 articles.
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