Affiliation:
1. NTT Applied Electronics Laboratories, Midori-cho, Musashino-shi, Tokyo 180, Japan
Abstract
An attempt was made to improve the tribological properties of WS2 sputtered film by bombarding the film surface with various inert gaseous ions (He+, Ar+, Kr+, Xe+). The resulting changes in tribological properties were investigated together with related changes in physical properties such as morphology and crystallinity of the films. Bombardment by He+ and Ar+ effectively reduces WS2 film friction, whereas Kr+ – and Xe+ – bombardment increased WS2 film friction. The effect of high-energy ion bombardment is discussed in relation to the crystallinity of WS2 film.
Subject
Surfaces, Coatings and Films,Surfaces and Interfaces,Mechanical Engineering,Mechanics of Materials
Cited by
6 articles.
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