A Gaussian Process Model-Guided Surface Polishing Process in Additive Manufacturing
Author:
Affiliation:
1. Department of Industrial & Systems Engineering, Texas A&M University, College Station, TX 77843
2. Design Optimization Team, Weapons and Materials Research Directorate, Army Research Lab, Aberdeen Proving Ground, Adelphi, MD 21005
Abstract
Funder
Army Research Lab
NSF
Texas A&M Office
Publisher
ASME International
Subject
Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering
Link
http://asmedigitalcollection.asme.org/manufacturingscience/article-pdf/doi/10.1115/1.4045334/6450492/manu_142_1_011003.pdf
Reference21 articles.
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3. Material Removal Mechanism in Chemical Mechanical Polishing: Theory and Modeling;Luo;IEEE Trans. Semicond. Manuf.,2001
4. Influence of Colloidal Abrasive Size on Material Removal Rate and Surface Finish in SiO2 Chemical Mechanical Polishing;Zhou;Tribol. Trans.,2002
5. Technological Advances in Fine Abrasive Processes;Komanduri;CIRP Ann.,1997
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