A Methodology to Improve Manufacturing Precision in the Presence of Workpiece Imperfections

Author:

Lee Neville1,Joneja Ajay1

Affiliation:

1. Dept. of Industrial Engineering, Hong Kong University of Science and Technology, Clear Water Bay, Kowloon, Hong Kong

Abstract

In modern manufacturing applications of products such as LCD’s, semiconductor wafers, and thin film heads, the workpiece has to be processed in multiple steps. The quality and yield of the products depends on how precisely the workpiece is aligned in each setup. The effect of imperfections of the workpiece on the manufacturing precision are analyzed, and our analysis shows that the imperfections of the workpiece can be a major cause of tolerance problems. A methodology that can help to greatly reduce the sensitivity of imperfections in the workpiece has been proposed. The methodology is applied to the 2-D domain, and is substantiated by characterization and analysis of samples from the LCD industry.

Publisher

ASME International

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Control and Systems Engineering

Reference19 articles.

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2. Mickan Uwe , and RinnKlaus, “Absolute Pattern Placement Metrology On Wafers,” SPIE (The Society of Photo-Optical Instrumentation Engineers), Vol. 1926, pp. 412–419, 1993.

3. Zaidi S. H. , FrauenglassA., and BrueckS. R. J., “Moire’ Interferometric Alignment And Overlay Techniques,” SPIE, Vol. 2196, pp. 371–382, 1994.

4. O’Mara, W. C., Liquid Crystal Flat Panel Displays, Chapter 2, Van Nostrand Reinhold.

5. Jorgensen, Finn, The Complete Handbook of Magnetic Recording, Chapter 9, Tab Books, 1988.

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