Stainless Steel Films Deposited by dc Unbalanced Magnetron Sputtering Using SUS304 Steel Target-Reference-Cited by-同舟云学术

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Stainless Steel Films Deposited by dc Unbalanced Magnetron Sputtering Using SUS304 Steel Target

Published:2000 Issue:12 Volume:64 Page:1218-1223
ISSN:0021-4876
Container-title:Journal of the Japan Institute of Metals
language:en
Short-container-title:J. Japan Inst. Metals and Materials

Author:

Inoue Shozo¹,Saeki Toshiaki¹,Koterazawa Keiji¹,Uchida Hitoshi²,Iwasa Mikio³

Affiliation:

1. Department of Mechanical and Intelligent Engineering, Faculty of Engineering, Himeji Institute of Technology

2. Department of Mechanical Engineering, Faculty of Engineering, Himeji Institute of Technology

3. Department of Material Physics, Osaka National Research Institute

Publisher

Japan Institute of Metals

Subject

Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

https://www.jstage.jst.go.jp/article/jinstmet1952/64/12/64_12_1218/_pdf

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication of Ti-Ni Shape Memory Alloy Films by Unbalanced Magnetron Sputtering and Their Joule Heat Induced Shape Memory Behavior;Journal of the Vacuum Society of Japan;2008

2. Effects of ion flux on the properties of dc magnetron-sputtered stainless steel films;Vacuum;2002-08

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