Electrical Properties of (Cr, Ti)Si<SUB>2</SUB> Resistive Films for Thermal Printing Heads-Reference-Cited by-同舟云学术

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Electrical Properties of (Cr, Ti)Si₂ Resistive Films for Thermal Printing Heads

Published:1988 Issue:9 Volume:52 Page:894-898
ISSN:0021-4876
Container-title:Journal of the Japan Institute of Metals
language:en
Short-container-title:J. Japan Inst. Metals and Materials

Author:

Kaneko Toshiki¹,Kita Yoshiaki¹,Tsumura Makoto¹,Andoh Hisashi¹

Affiliation:

1. Hitachi Research Laboratory, Hitachi, Ltd.

Publisher

Japan Institute of Metals

Subject

Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

https://www.jstage.jst.go.jp/article/jinstmet1952/52/9/52_9_894/_pdf

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The influence of zirconium on the crystallization behavior and electrical properties of Cr–Si–Al resistive films;Materials Science and Engineering: A;2004-04

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