Reactive Diffusion in a Ni–Si Bulk Diffusion Couple
Author:
Affiliation:
1. Department of Materials Science and Engineering, Faculty of Engineering, Kyushu Institute of Technology
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/35/12/35_12_868/_pdf
Reference17 articles.
1. 1) G. Ottaviani: J. Vac. Sci. Technol., 16 (1979), 1112.
2. 2) K. N. Tu: Ann. Rev. Mater. Sci., 15 (1985), 147.
3. 3) A. Hiraki: Oyo buturi, 51 (1982), 143.
4. 4) T. Ito and N. Fujimura: Bul. Japan Inst. Metals, 28 (1989), 785.
5. 5) J. O. Olowolafe, M. A. Nicolet and J. W. Mayer: Thin Solid Films, 38 (1976), 143.
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