Structures and Electric Characteristics of Al–N Thin Films Prepared by RF Sputtering
Author:
Affiliation:
1. Department of Materials Science and Engineering, Faculty of Engineering, Kyushu University
Publisher
Japan Institute of Metals
Subject
General Engineering
Link
https://www.jstage.jst.go.jp/article/matertrans1989/38/2/38_2_133/_pdf
Reference22 articles.
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2. 2) L. M. Sheppard: Ceram. Bull., 69 (1990), 1801.
3. 3) P. B. Legrand, W. Wautelet, B. Dugnoille, J. P. Dauchot and M. Hecq: Thin Solid Films, 248 (1994), 220.
4. 4) G. Este, R. Surridge and W. D. Westwood: J. Vac. Sci. Tech. A, 4 (1986), 989.
5. 5) D. Y. Wang, Y. Nagahata, M. Masuda and Y. Hayashi: J. Vac. Sci. Tech. A, 14 (1996), 3092.
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