Growth Rate Constant and Chemical Diffusivity in Silicides Mo<SUB>5</SUB>Si<SUB>3</SUB> and Ta<SUB>5</SUB>Si<SUB>3</SUB>-Reference-Cited by-同舟云学术

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Growth Rate Constant and Chemical Diffusivity in Silicides Mo₅Si₃ and Ta₅Si₃

Published:1998 Issue:2 Volume:39 Page:286-291
ISSN:0916-1821
Container-title:Materials Transactions, JIM
language:en
Short-container-title:Mater. Trans., JIM

Author:

Christian Francis¹,Sohma Hideaki²,Tanaka Toshiaki²,Tanaka Hiroyuki³,Ohsasa Ken-ichi¹,Narita Toshio¹

Affiliation:

1. Graduate School of Engineering, Hokkaido University

2. Muroran Techno-Center Foundation

3. Hokkaido Industrial Research Institute

Publisher

Japan Institute of Metals

Subject

General Engineering

Link

https://www.jstage.jst.go.jp/article/matertrans1989/39/2/39_2_286/_pdf

Reference7 articles.

1. 1) Metals Handbook, 10th Edition, ed. by J. R. Davis, ASM International Handbook Committee, Vol. 2 (1990), p. 933.

2. 2) D. M. Shah, D. Berczik, D. L. Anton and R. Hecht: Mat. Sci. and Eng., A155 (1992), 45.

3. 3) Diffusion Data, ed. by F. H. Wohlbier, Diffusion Information Centre, Vol. 4, No. 1.4, (1970), p. 145.

4. 4) R. W. Bartlet, P. R. Gage and P. A. Larssen: Trans. AIME, 230 (1964), 1528.

5. 5) M. J. Rice Jr. and K. R. Sarma: J. Electrochem Soc., 128 (1981), 1368.

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