1. 1) K. K. Yee: Int. Met. Rev., 1 (1978), 19-42.
2. 2) B. M. Kramer and P. K. Judd: J. Vac. Sci. Technol., 11 (1974), 680-686.
3. 3) S. M. Sze: VLSI TECHNOLOGY, McGraw-Hill Inc., (1984), pp. 359-361.
4. 4) J. C. Vossen and W. Kern: Thin Film Processing, Academic Press Inc., (1978), pp. 283-304.
5. 5) CVD Handbook, Ed. H. Komiyama et al., J. Inst. Chem. Eng., Asakura Shoten Inc., (1991), pp. 146-148 (in Japanese).