Characteristic Depth Profiles of Surface Layers Formed in Cu-based Alloys by Annealing in Low Partial Pressure of Oxygen-Reference-Cited by-同舟云学术

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Characteristic Depth Profiles of Surface Layers Formed in Cu-based Alloys by Annealing in Low Partial Pressure of Oxygen

Published:2004 Issue:2 Volume:45 Page:411-414
ISSN:1345-9678
Container-title:MATERIALS TRANSACTIONS
language:en
Short-container-title:Mater. Trans.

Author:

Suzuki Shigeru¹,Kimura Tarou²,Eto Masatoshi²,Mori Masazumi²,Waseda Yoshio¹

Affiliation:

1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University

2. Technology Development Center, Nippon Mining & Metals Co. Ltd.

Publisher

Japan Institute of Metals

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Link

https://www.jstage.jst.go.jp/article/matertrans/45/2/45_2_411/_pdf

Reference11 articles.

1. 1) S. Suzuki, K. Hirabayshi, K. Mimura, T. Okabe, M. Isshiki and Y. Waseda: Mater. Trans. 43 (2002) 2303-2308.

2. 2) K. Chiang, T.A. Wallace and K. Clark: Surf. Coatings Tech. 86-87 (1996) 48-55.

3. 3) S.K. Lahiri, N.K. Waalib Singh, K.W. Heng, L. Ang and L.C. Goh: Microelectronics Journal 28 (1998) 335-341.

4. 4) S.J. Cho and K.W. Paik: Scr. Mater. 38 (1998), 1149-1154.

5. 5) S. Suzuki, Y. Ishikawa, M. Isshiki and Y. Waseda: Mater. Trans. 43 (2002) 2523-2526.

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