Prospect for Semiconductor Microfabrication Technology and Materials Development Utilizing Polymer Self-Assembly
Author:
Publisher
Japan Institute of Electronics Packaging
Subject
Electrical and Electronic Engineering
Link
https://www.jstage.jst.go.jp/article/jiep/20/1/20_2/_pdf
Reference24 articles.
1. 3) I. W. Hamley: “Developments in Block Copolymer Science and Technology,” ed. I. W. Hamley, Jhon Wiley & Sons, p. 1, 2004
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3. 5) R. A. Segalman, H. Yokoyama, and E. J. Kramer: “Graphoepitaxy of Spherical Domain Block Copolymer Films,” Adv. Mater., Vol. 13, pp. 1152-1155, 2001
4. 6) S. O. Kim, H. H. Solak, M. P. Stoykovich, N. J. Ferrier, J. J. de Pablo, and P. F. Nealey: “Epitaxial self-assembly of block copolymers on lithographically defined nanopatterned substrates,” Nature, Vol. 424, pp. 411-414, 2003
5. 7) R. Ruiz, H. Kang, F. A. Detcheverry, E. Dobisz, D. S. Kercher, T. R. Alberecht, J. J. de Pablo, and P. F. Nealey: “Density Multiplication and Improved Lithography by Directed Block Copolymer Assembly,” Science, Vol. 321, pp. 936-939, 2008
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