Impact of copper back contact in CdTe solar cells: study of defects by temperature-dependent capacitance–voltage measurements

Author:

Kharangarh Poonam R.1,Georgiou George E.2,Chin Ken K.3

Affiliation:

1. Department of Physics, New Jersey Institute of Technology (NJIT), University Heights, Newark, NJ, USA

2. Professor, Department of Physics, New Jersey Institute of Technology (NJIT), University Heights, Newark, NJ, USA

3. Lecturer, Department of Physics, New Jersey Institute of Technology (NJIT), University Heights, Newark, NJ, USA

Abstract

Copper diffusion from back contact creates semishallow and deep-level defects in n+-CdS/p-CdTe solar cells. This study analyzes the impact of copper as a function of annealing temperatures during back contact formation. The observed defect levels, formed after copper diffusion, were identified by employing the temperature-dependent capacitance–voltage (C-V) characteristics at reverse bias in the dark. Theoretical background involving recombination centers, defect density and the role of impurity defects (copper-related defects) suggests that the temperature-dependent C-V profiling is a suitable technique to investigate the copper-related defects. Samples, annealed at 160°C for 30 min, show only one energy level, whereas samples annealed at 280ºC for 30 min reveal two distinct deep levels. From the reported observations, the trap levels were identified as copper-related defects. Variation in annealing temperature can impact the defect formation process: substitutional impurities of copper (160°C) and deep levels (280°C).

Publisher

Thomas Telford Ltd.

Subject

Condensed Matter Physics,General Materials Science

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3